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Journal description
All volumes of the corresponding journal
All issues of the corresponding volume
All articles of the corresponding issues
Details for article 4 of 10 found articles
| Title: |
Equations of exposure time and X-ray mask absorber thickness in the LIGA process |
| Author: |
Gil, K. H. Lee, S. S. Youm, Y. |
| Appeared in: |
Microsystem technologies |
| Paging: | Volume 7 (2001) nr. 1 pages 1-5 |
| Year: |
2001 |
| Contents: | |
| Publisher: |
Springer-Verlag, Berlin/Heidelberg |
| Source file: |
Elektronische Wetenschappelijke Tijdschriften |
Details for article 4 of 10 found articles
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