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Journal description
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Details for article 2 of 52 found articles
| Title: |
A method to fabricate high-aspect-ratio microstructures using PMMA photoresist |
| Author: |
Zhang, Tianchong Yi, Futing Wang, Bo Liu, Jing Wang, Yuting Zhou, Yue |
| Appeared in: |
Microsystem technologies |
| Paging: | Volume 24 (2017) nr. 2 pages 1223-1226 |
| Year: |
2017 |
| Contents: | |
| Publisher: |
Springer Berlin Heidelberg, Berlin/Heidelberg |
| Source file: |
Elektronische Wetenschappelijke Tijdschriften |
Details for article 2 of 52 found articles
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