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Study of black silicon obtained by cryogenic plasma etching: approach to achieve the hot spot of a thermoelectric energy harvester |
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Titel: |
Study of black silicon obtained by cryogenic plasma etching: approach to achieve the hot spot of a thermoelectric energy harvester |
Auteur: |
Nguyen, K. N. Abi-Saab, D. Basset, P. Richalot, E. Malak, M. Pavy, N. Flourens, F. Marty, F. Angelescu, D. Leprince-Wang, Y. Bourouina, T. |
Verschenen in: |
Microsystem technologies |
Paginering: |
Jaargang 18 (2012) nr. 11 pagina's 1807-1814 |
Jaar: |
2012 |
Inhoud: |
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Uitgever: |
Springer-Verlag, Berlin/Heidelberg |
Bronbestand: |
Elektronische Wetenschappelijke Tijdschriften |
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