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Journal description
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Details for article 1 of 86 found articles
| Title: |
A new UV sensitive positive resist for X-ray masks manufacture |
| Author: |
Voigt, Anja Heinrich, Marina Gruetzner, Gabi Kouba, Josef Scheunemann, H.-U. Rudolph, I. |
| Appeared in: |
Microsystem technologies |
| Paging: | Volume 14 (2008) nr. 9-11 pages 1447-1450 |
| Year: |
2008 |
| Contents: | |
| Publisher: |
Springer-Verlag, Berlin/Heidelberg |
| Source file: |
Elektronische Wetenschappelijke Tijdschriften |
Details for article 1 of 86 found articles
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