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Journal description
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Details for article 6 of 6 found articles
| Title: |
Partial aliased effect number pattern and selection of optimal compromise designs |
| Author: |
Ye, Shili Wang, Dongying Zhang, Runchu |
| Appeared in: |
Metrika |
| Paging: | Volume 82 (2019) nr. 3 pages 269-293 |
| Year: |
2019 |
| Contents: | |
| Publisher: |
Springer Berlin Heidelberg, Berlin/Heidelberg |
| Source file: |
Elektronische Wetenschappelijke Tijdschriften |
Details for article 6 of 6 found articles
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