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                                       Details for article 18 of 37 found articles
 
 
  Modifying of etching anisotropy of silicon substrates by surface active agents
 
 
Title: Modifying of etching anisotropy of silicon substrates by surface active agents
Author: Rola, Krzysztof P.
Zubel, Irena
Appeared in: Central European journal of physics
Paging: Volume 9 (2011) nr. 2 pages 410-416
Year: 2011
Contents:
Publisher: SP Versita, Heidelberg
Source file: Elektronische Wetenschappelijke Tijdschriften
 
 

                             Details for article 18 of 37 found articles
 
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