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Journal description
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Details for article 8 of 15 found articles
| Title: |
Nanoscale atomic lithography with a cesium atomic beam |
| Author: |
Lison, F. Adams, H.-J. Haubrich, D. Kreis, M. Nowak, S. Meschede, D. |
| Appeared in: |
Applied physics. B, Lasers and optics |
| Paging: | Volume 65 (1997) nr. 3 pages 419-421 |
| Year: |
1997 |
| Contents: | |
| Publisher: |
Springer-Verlag, Berlin/Heidelberg |
| Source file: |
Elektronische Wetenschappelijke Tijdschriften |
Details for article 8 of 15 found articles
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