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Modulation of microstructure and optical properties of anti-reflection HfO2 films by sputtering power and O2/Ar flow ratio |
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Titel: |
Modulation of microstructure and optical properties of anti-reflection HfO2 films by sputtering power and O2/Ar flow ratio |
Auteur: |
Wu, Yuling Yu, Jingxia Yang, Liang Wu, Wei Wang, Xiangyu Tang, Min Li, Bo Zu, Xiaotao Xiang, Xia |
Verschenen in: |
Applied physics. B, Lasers and optics |
Paginering: |
Jaargang 129 () nr. 11 pagina's xx |
Jaar: |
2023-10-11 |
Inhoud: |
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Uitgever: |
Springer Berlin Heidelberg, Berlin/Heidelberg |
Bronbestand: |
Elektronische Wetenschappelijke Tijdschriften |
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