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Journal description
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Details for article 15 of 35 found articles
| Title: |
Fabrication of Step-and-Flash Imprint Lithography (S-FIL) templates using XeF2 enhanced focused ion-beam etching |
| Author: |
Kettle, J. Hoyle, R. T. Dimov, S. |
| Appeared in: |
Applied physics. Part A, Materials science and processing |
| Paging: | Volume 96 (2009) nr. 4 pages 819-825 |
| Year: |
2009 |
| Contents: | |
| Publisher: |
Springer-Verlag, Berlin/Heidelberg |
| Source file: |
Elektronische Wetenschappelijke Tijdschriften |
Details for article 15 of 35 found articles
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