Isotopic labeling study of oxygen diffusion in amorphous LaScO3 high-κ films on Si(100) and its effects on the electrical characteristics
Titel:
Isotopic labeling study of oxygen diffusion in amorphous LaScO3 high-κ films on Si(100) and its effects on the electrical characteristics
Auteur:
Lopes, J. M. J. Littmark, U. Roeckerath, M. Durǧun Özben, E. Lenk, S. Breuer, U. Besmehn, A. Stärk, A. Grande, P. L. Sortica, M. A. Radtke, C. Schubert, J. Mantl, S.
Verschenen in:
Applied physics. Part A, Materials science and processing