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Charge storage characteristics in Al/AlN/Si metal–insulator–semiconductor structure based on deep traps in AlN layer |
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Titel: |
Charge storage characteristics in Al/AlN/Si metal–insulator–semiconductor structure based on deep traps in AlN layer |
Auteur: |
Kong, Y.C. Hu, L.Q. Zheng, Y.D. Zhou, C.H. Chen, C. Gu, S.L. Zhang, R. Han, P. Jiang, R.L. Shi, Y. |
Verschenen in: |
Applied physics. Part A, Materials science and processing |
Paginering: |
Jaargang 90 (2007) nr. 3 pagina's 545-548 |
Jaar: |
2007 |
Inhoud: |
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Uitgever: |
Springer-Verlag, Berlin/Heidelberg |
Bronbestand: |
Elektronische Wetenschappelijke Tijdschriften |
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