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  An investigation into ultra-thin pseudobinary oxide (TiO2)x(Al2O3)1-x films as high-k gate dielectrics
 
 
Title: An investigation into ultra-thin pseudobinary oxide (TiO2)x(Al2O3)1-x films as high-k gate dielectrics
Author: Shi, Lei
Yin, Jiang
Yin, Kuibo
Gao, Feng
Xia, Yidong
Liu, Zhiguo
Appeared in: Applied physics. Part A, Materials science and processing
Paging: Volume 90 (2007) nr. 2 pages 379-384
Year: 2007
Contents:
Publisher: Springer-Verlag, Berlin/Heidelberg
Source file: Elektronische Wetenschappelijke Tijdschriften
 
 

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