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Journal description
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Details for article 43 of 71 found articles
| Title: |
Magnetoresistance of nanocrystalline Co-AlN films |
| Author: |
Li, Meifang Shi, Ji Nakamura, Yoshio Yu, Ronghai |
| Appeared in: |
Applied physics. Part A, Materials science and processing |
| Paging: | Volume 89 (2007) nr. 3 pages 807-812 |
| Year: |
2007 |
| Contents: | |
| Publisher: |
Springer-Verlag, Berlin/Heidelberg |
| Source file: |
Elektronische Wetenschappelijke Tijdschriften |
Details for article 43 of 71 found articles
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