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                                       Details for article 17 of 43 found articles
 
 
  Fabrication of high-aspect-ratio silicon nanostructures using near-field scanning optical lithography and silicon anisotropic wet-etching process
 
 
Title: Fabrication of high-aspect-ratio silicon nanostructures using near-field scanning optical lithography and silicon anisotropic wet-etching process
Author: Kwon, S.J.
Jeong, Y.M.
Jeong, S.H.
Appeared in: Applied physics. Part A, Materials science and processing
Paging: Volume 86 (2006) nr. 1 pages 11-18
Year: 2006
Contents:
Publisher: Springer-Verlag, Berlin/Heidelberg
Source file: Elektronische Wetenschappelijke Tijdschriften
 
 

                             Details for article 17 of 43 found articles
 
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 Koninklijke Bibliotheek - National Library of the Netherlands