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                                       Details for article 9 of 17 found articles
 
 
  Investigation of W-Ge-N deposited on Ge as a diffusion barrier for Cu metallization
 
 
Title: Investigation of W-Ge-N deposited on Ge as a diffusion barrier for Cu metallization
Author: Rawal, S.
Norton, D.P.
Anderson, T.J.
McElwee-White, L.
Appeared in: Applied physics. Part A, Materials science and processing
Paging: Volume 85 (2006) nr. 3 pages 325-329
Year: 2006
Contents:
Publisher: Springer-Verlag, Berlin/Heidelberg
Source file: Elektronische Wetenschappelijke Tijdschriften
 
 

                             Details for article 9 of 17 found articles
 
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 Koninklijke Bibliotheek - National Library of the Netherlands