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Journal description
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Details for article 35 of 38 found articles
| Title: |
The influence of oxide/nitride surface layers on diffusion in Si and SiGe |
| Author: |
Zangenberg, N.R. Chevallier, J. Hansen, J.L. Nylandsted Larsen, A |
| Appeared in: |
Applied physics. Part A, Materials science and processing |
| Paging: | Volume 81 (2004) nr. 5 pages 1077-1082 |
| Year: |
2004 |
| Contents: | |
| Publisher: |
Springer Berlin Heidelberg, Berlin/Heidelberg |
| Source file: |
Elektronische Wetenschappelijke Tijdschriften |
Details for article 35 of 38 found articles
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