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Journal description
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Details for article 14 of 50 found articles
| Title: |
Fabricating high-aspect-ratio sub-diffraction-limit structures on silicon with two-photon photopolymerization and reactive ion etching |
| Author: |
Lee, C.-H. Chang, T.-W. Lee, K.-L. Lin, J.-Y. Wang, J. |
| Appeared in: |
Applied physics. Part A, Materials science and processing |
| Paging: | Volume 79 (2004) nr. 8 pages 2027-2031 |
| Year: |
2004 |
| Contents: | |
| Publisher: |
Springer Berlin Heidelberg, Berlin/Heidelberg |
| Source file: |
Elektronische Wetenschappelijke Tijdschriften |
Details for article 14 of 50 found articles
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