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Pushing feature size down to 11 nm by hyperbolic metamaterials-based interference photolithography under illumination of UV light source |
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Titel: |
Pushing feature size down to 11 nm by hyperbolic metamaterials-based interference photolithography under illumination of UV light source |
Auteur: |
Yang, Xuefeng Zhang, Shuxia Wang, Baoji Cai, Xiaolin Li, Xiaohua Yu, Weiyang Wang, Qin Lu, Zhongliang |
Verschenen in: |
Applied physics. Part A, Materials science and processing |
Paginering: |
Jaargang 129 () nr. 2 pagina's xx |
Jaar: |
2023-01-09 |
Inhoud: |
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Uitgever: |
Springer Berlin Heidelberg, Berlin/Heidelberg |
Bronbestand: |
Elektronische Wetenschappelijke Tijdschriften |
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