|
| << previous | next >> |
Journal description
All volumes of the corresponding journal
All issues of the corresponding volume
All articles of the corresponding issues
Details for article 8 of 49 found articles
| Title: |
Dependence of O2 and Ar2 flow rates on the physical properties of ATO thin films deposited by atmospheric pressure chemical vapor deposition (APCVD) |
| Author: |
Fadavieslam, M. R. Sadra, S. |
| Appeared in: |
Applied physics. Part A, Materials science and processing |
| Paging: | Volume 123 (2017) nr. 11 pages 1-10 |
| Year: |
2017 |
| Contents: | |
| Publisher: |
Springer Berlin Heidelberg, Berlin/Heidelberg |
| Source file: |
Elektronische Wetenschappelijke Tijdschriften |
Details for article 8 of 49 found articles
| << previous | next >> |