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                                       Details for article 52 of 67 found articles
 
 
  Rippled area formed by surface plasmon polaritons upon femtosecond laser double-pulse irradiation of silicon: the role of carrier generation and relaxation processes
 
 
Title: Rippled area formed by surface plasmon polaritons upon femtosecond laser double-pulse irradiation of silicon: the role of carrier generation and relaxation processes
Author: Derrien, Thibault J.-Y.
Krüger, Jörg
Itina, Tatiana E.
Höhm, Sandra
Rosenfeld, Arkadi
Bonse, Jörn
Appeared in: Applied physics. Part A, Materials science and processing
Paging: Volume 117 (2013) nr. 1 pages 77-81
Year: 2013
Contents:
Publisher: Springer Berlin Heidelberg, Berlin/Heidelberg
Source file: Elektronische Wetenschappelijke Tijdschriften
 
 

                             Details for article 52 of 67 found articles
 
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