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Nanoscale gap filling for phase change material by pulsed deposition and inductively coupled plasma etching |
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Title: |
Nanoscale gap filling for phase change material by pulsed deposition and inductively coupled plasma etching |
Author: |
Ren, W. C. Liu, B. Song, Z. T. Jing, X. Z. Zhang, B. C. Xiang, Y. H. Xiao, H. B. Xu, J. Wu, G. P. Qi, R. J. Duan, S. Q. Yu, Q. Q. Feng, S. L. |
Appeared in: |
Applied physics. Part A, Materials science and processing |
Paging: |
Volume 112 (2012) nr. 4 pages 999-1002 |
Year: |
2012 |
Contents: |
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Publisher: |
Springer Berlin Heidelberg, Berlin/Heidelberg |
Source file: |
Elektronische Wetenschappelijke Tijdschriften |
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