A lithography-independent and fully confined fabrication process of phase-change materials in metal electrode nanogap with 16-μA threshold current and 80-mV SET voltage
Titel:
A lithography-independent and fully confined fabrication process of phase-change materials in metal electrode nanogap with 16-μA threshold current and 80-mV SET voltage
Auteur:
Fu, Yingchun Wang, Xiaofeng Zhang, Jiayong Wang, Xiaodong Chang, Chun Ma, Huili Cheng, Kaifang Chen, Xiaogang Song, Zhitang Feng, Songlin Ji, An Yang, Fuhua
Verschenen in:
Applied physics. Part A, Materials science and processing