SrHf0.67Ti0.33O3 high-k films deposited on Si by pulsed laser deposition
Titel:
SrHf0.67Ti0.33O3 high-k films deposited on Si by pulsed laser deposition
Auteur:
Yan, L. Xu, Z. L. Grygiel, C. McMitchell, S. R. C. Suchomel, M. R. Bacsa, J. Clark, J. H. Niu, H. J. Romani, S. Palgrave, R. G. Chalker, P. R. Rosseinsky, M. J.
Verschenen in:
Applied physics. Part A, Materials science and processing