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Journal description
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Details for article 9 of 10 found articles
| Title: |
Simulating the chlorine plasma etching profile of high-aspect-ratio trenches in Si |
| Author: |
Shumilov, A. S. Amirov, I. I. Luckichev, V. F. |
| Appeared in: |
Russian microelectronics |
| Paging: | Volume 46 (2017) nr. 5 pages 301-308 |
| Year: |
2017 |
| Contents: | |
| Publisher: |
Pleiades Publishing, Moscow |
| Source file: |
Elektronische Wetenschappelijke Tijdschriften |
Details for article 9 of 10 found articles
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