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Journal description
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Details for article 2 of 12 found articles
| Title: |
Effect of Ar and He additives on the kinetics of GaAs etching in CF2Cl2 plasma |
| Author: |
Pivovarenok, S. A. |
| Appeared in: |
Russian microelectronics |
| Paging: | Volume 46 (2017) nr. 3 pages 211-215 |
| Year: |
2017 |
| Contents: | |
| Publisher: |
Pleiades Publishing, Moscow |
| Source file: |
Elektronische Wetenschappelijke Tijdschriften |
Details for article 2 of 12 found articles
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