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Journal description
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Details for article 4 of 7 found articles
| Title: |
Plasma parameters and mechanisms of GaAs reactive plasma etching in mixtures of HCl with argon and chlorine |
| Author: |
Dunaev, A. V. Pivovarenok, S. A. Efremov, A. M. Svettsov, V. I. Kapinos, S. P. Yudina, A. V. |
| Appeared in: |
Russian microelectronics |
| Paging: | Volume 42 (2013) nr. 4 pages 212-219 |
| Year: |
2013 |
| Contents: | |
| Publisher: |
Springer US, Boston |
| Source file: |
Elektronische Wetenschappelijke Tijdschriften |
Details for article 4 of 7 found articles
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