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Journal description
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Details for article 4 of 9 found articles
| Title: |
Nonempirical simulation of chemical deposition of silicon nitride films in CVD reactors |
| Author: |
Makhviladze, T. M. Minushev, A. Kh. Sarychev, M. E. |
| Appeared in: |
Russian microelectronics |
| Paging: | Volume 41 (2012) nr. 3 pages 196-205 |
| Year: |
2012 |
| Contents: | |
| Publisher: |
SP MAIK Nauka/Interperiodica, Dordrecht |
| Source file: |
Elektronische Wetenschappelijke Tijdschriften |
Details for article 4 of 9 found articles
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