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                                       Details for article 4 of 10 found articles
 
 
  Formation of thin-film HfO2/Si(100) structures by high-frequency magnetron sputtering
 
 
Title: Formation of thin-film HfO2/Si(100) structures by high-frequency magnetron sputtering
Author: Rudakov, V. I.
Bogoyavlenskaya, E. A.
Denisenko, Yu. I.
Naumov, V. V.
Appeared in: Russian microelectronics
Paging: Volume 40 (2011) nr. 6 pages 383-388
Year: 2011
Contents:
Publisher: SP MAIK Nauka/Interperiodica, Dordrecht
Source file: Elektronische Wetenschappelijke Tijdschriften
 
 

                             Details for article 4 of 10 found articles
 
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