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  Control of the formation of ultrathin CoSi2 layers during the rapid thermal annealing of Ti/Co/Ti/Si(100) structures
 
 
Title: Control of the formation of ultrathin CoSi2 layers during the rapid thermal annealing of Ti/Co/Ti/Si(100) structures
Author: Rudakov, V. I.
Denisenko, Yu. I.
Naumov, V. V.
Simakin, S. G.
Appeared in: Russian microelectronics
Paging: Volume 40 (2011) nr. 6 pages 389-394
Year: 2011
Contents:
Publisher: SP MAIK Nauka/Interperiodica, Dordrecht
Source file: Elektronische Wetenschappelijke Tijdschriften
 
 

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