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Journal description
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Details for article 4 of 8 found articles
| Title: |
Improved multistep method of ion implantation into silicon for IC manufacture |
| Author: |
Plebanovich, V. I. Chelyadinskii, A. R. Vasil’ev, Yu. B. Gladchuk, A. I. Osipov, V. E. |
| Appeared in: |
Russian microelectronics |
| Paging: | Volume 37 (2008) nr. 3 pages 187-191 |
| Year: |
2008 |
| Contents: | |
| Publisher: |
SP MAIK Nauka/Interperiodica, Dordrecht |
| Source file: |
Elektronische Wetenschappelijke Tijdschriften |
Details for article 4 of 8 found articles
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