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Details for article 3 of 13 found articles
| Title: |
Degradation pattern of thin HfO2 films on Si(100) under ultrahigh-vacuum annealing: An investigation by x-ray photoelectron spectroscopy and low-energy ion scattering |
| Author: |
Zenkevich, A. V. Lebedinskii, Y. Y. Barantsev, N. S. Nevolin, V. N. Kulikauskas, V. S. Scarel, G. Fanciulli, M. |
| Appeared in: |
Russian microelectronics |
| Paging: | Volume 35 (2006) nr. 4 pages 210-215 |
| Year: |
2006 |
| Contents: | |
| Publisher: |
Nauka/Interperiodica, Moscow |
| Source file: |
Elektronische Wetenschappelijke Tijdschriften |
Details for article 3 of 13 found articles
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