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                                       Details for article 2 of 18 found articles
 
 
  Anisotropic Etching of SiO2 in High-Voltage Gas-Discharge Plasmas
 
 
Title: Anisotropic Etching of SiO2 in High-Voltage Gas-Discharge Plasmas
Author: Kazanskii, N. L.
Kolpakov, V. A.
Kolpakov, A. I.
Appeared in: Russian microelectronics
Paging: Volume 33 (2004) nr. 3 pages 169-182
Year: 2004
Contents:
Publisher: Kluwer Academic Publishers-Plenum Publishers, New York
Source file: Elektronische Wetenschappelijke Tijdschriften
 
 

                             Details for article 2 of 18 found articles
 
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