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                                       Details for article 17 of 18 found articles
 
 
  ZnO Thin Films with Hole Conduction Produced by N Ion Implantation and Oxygen-Radical Annealing
 
 
Title: ZnO Thin Films with Hole Conduction Produced by N Ion Implantation and Oxygen-Radical Annealing
Author: A. N. Georgobiani
A. N. Gruzintsev
V. T. Volkov
M. O. Vorob'ev
V. A. Dravin
Appeared in: Russian microelectronics
Paging: Volume 33 (2004) nr. 3 pages 4 p.
Year: 2004-05/06-/06
Contents:
Publisher: Kluwer Academic/Plenum Publishers, New York, U.S.A.
Source file: Elektronische Wetenschappelijke Tijdschriften
 
 

                             Details for article 17 of 18 found articles
 
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