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Details for article 1 of 18 found articles
| Title: |
Anisotropic Etching of SiO2 in High-Voltage Gas-Discharge Plasmas |
| Author: |
N. L. Kazanskii V. A. Kolpakov A. I. Kolpakov |
| Appeared in: |
Russian microelectronics |
| Paging: | Volume 33 (2004) nr. 3 pages 14 p. |
| Year: |
2004-05/06-/06 |
| Contents: | |
| Publisher: |
Kluwer Academic/Plenum Publishers, New York, U.S.A. |
| Source file: |
Elektronische Wetenschappelijke Tijdschriften |
Details for article 1 of 18 found articles
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