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Journal description
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Details for article 12 of 22 found articles
| Title: |
Isotropic Plasma Etching of SiO2 Films |
| Author: |
Kovalevskii, A. A. Malyshev, V. S. Tsybul'skii, V. V. Sorokin, V. M. |
| Appeared in: |
Russian microelectronics |
| Paging: | Volume 31 (2002) nr. 5 pages 290-294 |
| Year: |
2002 |
| Contents: | |
| Publisher: |
Kluwer Academic Publishers-Plenum Publishers, New York |
| Source file: |
Elektronische Wetenschappelijke Tijdschriften |
Details for article 12 of 22 found articles
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