|
| << previous | next >> |
Journal description
All volumes of the corresponding journal
All issues of the corresponding volume
All articles of the corresponding issues
Details for article 17 of 26 found articles
| Title: |
Plasma chemical etching of photoresist layers based on diazonaphthoquinones in an installation with remote oxygen plasma |
| Author: |
Speshilova, A. B. Solov’ev, Yu. V. Alexandrov, S. E. |
| Appeared in: |
Russian journal of applied chemistry |
| Paging: | Volume 89 (2016) nr. 8 pages 1317-1321 |
| Year: |
2016 |
| Contents: | |
| Publisher: |
Pleiades Publishing, Moscow |
| Source file: |
Elektronische Wetenschappelijke Tijdschriften |
Details for article 17 of 26 found articles
| << previous | next >> |