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Journal description
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Details for article 15 of 17 found articles
| Title: |
Removal of Tin from Extreme Ultraviolet Collector Optics by In-Situ Hydrogen Plasma Etching |
| Author: |
Elg, Daniel T. Panici, Gianluca A. Liu, Sumeng Girolami, Gregory Srivastava, Shailendra N. Ruzic, David N. |
| Appeared in: |
Plasma chemistry and plasma processing |
| Paging: | Volume 38 (2017) nr. 1 pages 223-245 |
| Year: |
2017 |
| Contents: | |
| Publisher: |
Springer US, New York |
| Source file: |
Elektronische Wetenschappelijke Tijdschriften |
Details for article 15 of 17 found articles
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