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Journal description
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Details for article 6 of 8 found articles
| Title: |
Etching Characteristics and Mechanisms of Mo and Al2O3 Thin Films in O2/Cl2/Ar Inductively Coupled Plasmas: Effect of Gas Mixing Ratios |
| Author: |
Kang, Sungchil Efremov, Alexander Yun, Sun Jin Son, Jinyoung Kwon, Kwang-Ho |
| Appeared in: |
Plasma chemistry and plasma processing |
| Paging: | Volume 33 (2013) nr. 2 pages 527-538 |
| Year: |
2013 |
| Contents: | |
| Publisher: |
Springer US, Boston |
| Source file: |
Elektronische Wetenschappelijke Tijdschriften |
Details for article 6 of 8 found articles
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