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Effects of Oxygen Addition and Treating Distance on Surface Cleaning of ITO Glass by a Non-Equilibrium Nitrogen Atmospheric-Pressure Plasma Jet |
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Titel: |
Effects of Oxygen Addition and Treating Distance on Surface Cleaning of ITO Glass by a Non-Equilibrium Nitrogen Atmospheric-Pressure Plasma Jet |
Auteur: |
Chiang, M.-H. Liao, K.-C. Lin, I.-M. Lu, C.-C. Huang, H.-Y. Kuo, C.-L. Wu, J.-S. Hsu, C.-C. Chen, S.-H. |
Verschenen in: |
Plasma chemistry and plasma processing |
Paginering: |
Jaargang 30 (2010) nr. 5 pagina's 553-563 |
Jaar: |
2010 |
Inhoud: |
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Uitgever: |
Springer US, Boston |
Bronbestand: |
Elektronische Wetenschappelijke Tijdschriften |
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