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Journal description
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Details for article 8 of 22 found articles
| Title: |
Effect of Wafer Temperature on High Aspect Ratio Hardmask Etching |
| Author: |
Lee, S. Tien, Y.-C. Chang, Y.-W. |
| Appeared in: |
Plasma chemistry and plasma processing |
| Paging: | Volume 22 (2002) nr. 4 pages 627-637 |
| Year: |
2002 |
| Contents: | |
| Publisher: |
Kluwer Academic Publishers-Plenum Publishers, New York |
| Source file: |
Elektronische Wetenschappelijke Tijdschriften |
Details for article 8 of 22 found articles
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