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Journal description
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Details for article 15 of 18 found articles
| Title: |
Inductively Coupled Plasma Etching in ICl- and IBr-Based Chemistries. Part II: InP, InSb, InGaP, and InGaAs |
| Author: |
Y. B. Hahn D. C. Hays H. Cho K. B. Jung E. S. Lambers C. R. Abernathy S. J. Pearton W. S. Hobson R. J. Shul |
| Appeared in: |
Plasma chemistry and plasma processing |
| Paging: | Volume 20 (2000) nr. 3 pages 11 p. |
| Year: |
2000-09 |
| Contents: | |
| Publisher: |
Kluwer Academic/Plenum Publishers, New York, U.S.A. |
| Source file: |
Elektronische Wetenschappelijke Tijdschriften |
Details for article 15 of 18 found articles
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