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Journal description
All volumes of the corresponding journal
All issues of the corresponding volume
All articles of the corresponding issues
Details for article 8 of 12 found articles
| Title: |
Etching of Silicon Nitride in CCl2F2, CHF3, SiF4, and SF6 Reactive Plasma: A Comparative Study |
| Author: |
Pant, B. D. Tandon, U. S. |
| Appeared in: |
Plasma chemistry and plasma processing |
| Paging: | Volume 19 (1999) nr. 4 pages 545-563 |
| Year: |
1999 |
| Contents: | |
| Publisher: |
Kluwer Academic Publishers-Plenum Publishers, New York |
| Source file: |
Elektronische Wetenschappelijke Tijdschriften |
Details for article 8 of 12 found articles
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