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Journal description
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Details for article 7 of 18 found articles
| Title: |
On the Correlation Between Deposition Rate and Process Parameters in Remote Plasma-Enhanced Chemical Vapor Deposition |
| Author: |
Ch. Bayer Ph. Rudolf von Rohr |
| Appeared in: |
Plasma chemistry and plasma processing |
| Paging: | Volume 18 (1998) nr. 2 pages 26 p. |
| Year: |
1998-06 |
| Contents: | |
| Publisher: |
Kluwer Academic/Plenum Publishers, New York, U.S.A. |
| Source file: |
Elektronische Wetenschappelijke Tijdschriften |
Details for article 7 of 18 found articles
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