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Novel one-component molecular glass photoresist based on cyclotriphosphazene containing t-butyloxy carbonyl group for i-line lithography |
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Titel: |
Novel one-component molecular glass photoresist based on cyclotriphosphazene containing t-butyloxy carbonyl group for i-line lithography |
Auteur: |
Li, Hu Zhou, Zhen Liu, Jingcheng Zheng, Xiangfei Xu, Wenjia Ji, Changwei Shi, Weidong Liu, Ren Liu, Xiaoya |
Verschenen in: |
Journal of polymer research |
Paginering: |
Jaargang 24 (2017) nr. 4 pagina's 1-7 |
Jaar: |
2017 |
Inhoud: |
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Uitgever: |
Springer Netherlands, Dordrecht |
Bronbestand: |
Elektronische Wetenschappelijke Tijdschriften |
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