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Journal description
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Details for article 10 of 20 found articles
| Title: |
Selective Formation of Titanium Silicide by Chemical Vapor Deposition Using Titanium Halides and Silicon Wafer as the Precursors |
| Author: |
Lee, Chi-Young |
| Appeared in: |
Journal of materials synthesis and processing |
| Paging: | Volume 6 (1998) nr. 1 pages 55-59 |
| Year: |
1998 |
| Contents: | |
| Publisher: |
Kluwer Academic Publishers-Plenum Publishers, New York |
| Source file: |
Elektronische Wetenschappelijke Tijdschriften |
Details for article 10 of 20 found articles
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