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                                       Details for article 23 of 62 found articles
 
 
  Embedded metal and L-shaped oxide layers in silicon on insulator MESFETs: higher electric field tolerance and lower high frequency gate capacitances
 
 
Title: Embedded metal and L-shaped oxide layers in silicon on insulator MESFETs: higher electric field tolerance and lower high frequency gate capacitances
Author: Farahzad, Elham
Naderi, Ali
Appeared in: Journal of materials science. Materials in electronics
Paging: Volume 33 () nr. 25 pages 19971-19984
Year: 2022-08-04
Contents:
Publisher: Springer US, New York
Source file: Elektronische Wetenschappelijke Tijdschriften
 
 

                             Details for article 23 of 62 found articles
 
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 Koninklijke Bibliotheek - National Library of the Netherlands