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Characterization of strained Si wafers by X-ray diffraction techniques |
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Titel: |
Characterization of strained Si wafers by X-ray diffraction techniques |
Auteur: |
Shimura, Takayoshi Kawamura, Kohta Asakawa, Masahiro Watanabe, Heiji Yasutake, Kiyoshi Ogura, Atsushi Fukuda, Kazunori Sakata, Osami Kimura, Shigeru Edo, Hiroki Iida, Satoshi Umeno, Masataka |
Verschenen in: |
Journal of materials science. Materials in electronics |
Paginering: |
Jaargang 19 (2008) nr. 1 pagina's 189-193 |
Jaar: |
2008 |
Inhoud: |
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Uitgever: |
Springer US, Boston |
Bronbestand: |
Elektronische Wetenschappelijke Tijdschriften |
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