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CW-diode laser crystallization of sputtered amorphous silicon on glass, SiNx, and SiO2 intermediate layers |
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Title: |
CW-diode laser crystallization of sputtered amorphous silicon on glass, SiNx, and SiO2 intermediate layers |
Author: |
Schmidl, G. Andrä, G. Bergmann, J. Gawlik, A. Höger, I. Anders, S. Schmidl, F. Tympel, V. Falk, F. |
Appeared in: |
Journal of materials science |
Paging: |
Volume 48 (2013) nr. 12 pages 4177-4182 |
Year: |
2013 |
Contents: |
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Publisher: |
Springer US, Boston |
Source file: |
Elektronische Wetenschappelijke Tijdschriften |
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