Photoresist ashing technology using N2/O2 ferrite-core ICP in the dual damascene process
Titel:
Photoresist ashing technology using N2/O2 ferrite-core ICP in the dual damascene process
Auteur:
Kim, Hyoun Woo Myung, Ju Hyun Lee, Jong Woo Kim, Hyung-Sun Kim, Keeho Jang, Jeong-Yeol Yoon, Tae-Ho Kim, Sung Kyeong Choi, Dae-Kyu Chung, Chin-Wook Yeom, Geun Young Myoung, Jae-Min Kim, Hyoung-June