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Journal description
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Details for article 35 of 68 found articles
| Title: |
Growth and characterization of UHV sputtering HfO2 film by plasma oxidation and low temperature annealing |
| Author: |
Li, Q. Wang, S. J. Wang, W. D. Chi, D. Z. Huan, A. C. H. Ong, C. K. |
| Appeared in: |
Journal of electroceramics |
| Paging: | Volume 16 (2006) nr. 4 pages 517-521 |
| Year: |
2006 |
| Contents: | |
| Publisher: |
Kluwer Academic Publishers, Boston |
| Source file: |
Elektronische Wetenschappelijke Tijdschriften |
Details for article 35 of 68 found articles
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